ASTM-F1188:2000 Edition

$40.63

F1188-00 Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption

Published By	Publication Date	Number of Pages
ASTM	2000	5

Guaranteed Safe Checkout

Category: ASTM

If you have any questions, feel free to reach out to our online customer service team by clicking on the bottom right corner. We’re here to assist you 24/7.
Email:[email protected]

Description

ASTM F1188-00

Historical Standard: Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption

ASTM F1188

Scope

1.1 This test method covers the determination of the interstitial oxygen content of single crystal silicon by infrared spectroscopy. This test method requires the use of an oxygen-free reference specimen and a set of calibration standards, such as those comprising NIST SRM 2551. It permits, but does not require, the use of a computerized spectrophotometer.

1.2 The useful range of oxygen concentration measurable by this test method is from 1 X 10¹⁶ atoms/cm³ to the maximum amount of interstitial oxygen soluble in silicon.

1.3 The oxygen concentration obtained using this test method assumes a linear relationship between the interstitial oxygen concentration and the absorption coefficient of the 1107 cm^-1 band associated with interstitial oxygen in silicon.

1.4 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Keywords

Infrared absorption; interstitial oxygen; oxygen; silicon

ICS Code

ICS Number Code 29.045 (Semiconducting materials)

DOI: 10.1520/F1188-00

Additional information

Standard Title	F1188-00 Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption
Published Code	ASTM
Publication Date	2000
Pages Count	5